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Unified modeling language description of the object-oriented multi-scale adaptive finite element method for step-and-flash imprint lithography simulations 

Paszynski, M.; Gurgul, P.; Sieniek, M.; Pardo, D.Autoridad BCAM (2014-12-31)
In the first part of the paper we present the multi-scale simulation of the Step-and-Flash Imprint Lithography (SFIL), a modern patterning process. The simulation utilizes the hp adaptive Finite Element Method (hp-FEM) ...

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AuthorGurgul, P. (1)Pardo, D. (1)
Paszyński, M. (1)
Sieniek, M. (1)
SubjectAdaptive finite element methods (1)Computational mechanics (1)Computer simulation (1)Coupled circuits (1)Degrees of freedom (mechanics) (1)
Finite element method (1)
Hierarchical structures (1)
Multi-scale simulation (1)
Multiscale problem (1)
Nanoimprint lithography (1)... másFecha2014 (1)

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